A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films.
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Chem Commun (Camb). 2020 Nov 18;56(89):13752-13755. doi: 10.1039/d0cc05781a. Epub 2020 Oct 16.
Chem Commun (Camb). 2020.
PMID: 33063069