Chung CW - Search Results

1

Damage-Free Plasma Source for Atomic-Scale Processing.

Park J, Jung J, Kim MS, Lim CM, Choi JE, Kim N, Kim JH, Chung CW. Park J, et al. Among authors: chung cw. Nano Lett. 2024 Sep 18;24(37):11462-11468. doi: 10.1021/acs.nanolett.4c02598. Epub 2024 Sep 6. Nano Lett. 2024. PMID: 39239915

2

Real-time dielectric-film thickness measurement system for plasma processing chamber wall monitoring.

Kim JY, Chung CW. Kim JY, et al. Among authors: chung cw. Rev Sci Instrum. 2015 Dec;86(12):123502. doi: 10.1063/1.4936770. Rev Sci Instrum. 2015. PMID: 26724022

3

A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in low-temperature plasmas.

Lim YM, Eo H, Kim KH, Lee MY, Chung CW. Lim YM, et al. Among authors: chung cw. Rev Sci Instrum. 2021 May 1;92(5):053531. doi: 10.1063/5.0044115. Rev Sci Instrum. 2021. PMID: 34243301

4

Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling.

Lee HC, Chung CW. Lee HC, et al. Among authors: chung cw. Sci Rep. 2015 Oct 20;5:15254. doi: 10.1038/srep15254. Sci Rep. 2015. PMID: 26482650 Free PMC article.

5

Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas.

Kim YC, Jang SH, Oh SJ, Lee HC, Chung CW. Kim YC, et al. Among authors: chung cw. Rev Sci Instrum. 2013 May;84(5):053505. doi: 10.1063/1.4802673. Rev Sci Instrum. 2013. PMID: 23742549

6

Probe diagnostics in the far scrape-off layer plasma of Korea Superconducting Tokamak Advanced Research tokamak using a sideband harmonic method.

Kim DH, Hong SH, Park IS, Lee HC, Kang HJ, Chung CW. Kim DH, et al. Among authors: chung cw. Rev Sci Instrum. 2015 Dec;86(12):123508. doi: 10.1063/1.4937610. Rev Sci Instrum. 2015. PMID: 26724028

7

Mechanism of solid-state plasma-induced dewetting for formation of copper and gold nanoparticles.

Kwon SH, Choe HJ, Lee HC, Chung CW, Lee JJ. Kwon SH, et al. Among authors: chung cw. J Nanosci Nanotechnol. 2013 Sep;13(9):6109-14. doi: 10.1166/jnn.2013.7682. J Nanosci Nanotechnol. 2013. PMID: 24205610

8

Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas.

Lee MH, Lee HC, Chung CW. Lee MH, et al. Among authors: chung cw. Phys Rev E Stat Nonlin Soft Matter Phys. 2010 Apr;81(4 Pt 2):046402. doi: 10.1103/PhysRevE.81.046402. Epub 2010 Apr 20. Phys Rev E Stat Nonlin Soft Matter Phys. 2010. PMID: 20481842

9

Radio frequency-compensated Langmuir probe with auxiliary double probes.

Oh SJ, Oh SJ, Chung CW. Oh SJ, et al. Among authors: chung cw. Rev Sci Instrum. 2010 Sep;81(9):093501. doi: 10.1063/1.3478338. Rev Sci Instrum. 2010. PMID: 20886976

10

A monitoring device made of an anodic aluminum oxide template for plasma-induced charging potential measurements in the high-aspect-ratio trench structure.

Park JH, Chung CW. Park JH, et al. Among authors: chung cw. Rev Sci Instrum. 2018 Nov;89(11):115006. doi: 10.1063/1.5042017. Rev Sci Instrum. 2018. PMID: 30501353

Save citations to file

Email citations

Send citations to clipboard

Add to Collections

Add to My Bibliography

Create a file for external citation management software

Your saved search

Your RSS Feed

My Custom Filters

Publication date

Text availability

Article attribute

Article type

Article Language

Species

Sex

Age

Other

390 results

Search Page

Filters