Chemical vapor deposition of layered two-dimensional MoSi2N4 materials.
Hong YL, Liu Z, Wang L, Zhou T, Ma W, Xu C, Feng S, Chen L, Chen ML, Sun DM, Chen XQ, Cheng HM, Ren W.
Hong YL, et al. Among authors: wang l.
Science. 2020 Aug 7;369(6504):670-674. doi: 10.1126/science.abb7023.
Science. 2020.
PMID: 32764066