Ellison CJ - Search Results

1

Photopatternable Interfaces for Block Copolymer Lithography.

Maher MJ, Bates CM, Blachut G, Carlson MC, Self JL, Janes DW, Durand WJ, Lane AP, Ellison CJ, Willson CG. Maher MJ, et al. Among authors: ellison cj. ACS Macro Lett. 2014 Aug 19;3(8):824-828. doi: 10.1021/mz500370r. Epub 2014 Aug 7. ACS Macro Lett. 2014. PMID: 35590708

2

Polymeric cross-linked surface treatments for controlling block copolymer orientation in thin films.

Bates CM, Strahan JR, Santos LJ, Mueller BK, Bamgbade BO, Lee JA, Katzenstein JM, Ellison CJ, Willson CG. Bates CM, et al. Among authors: ellison cj. Langmuir. 2011 Mar 1;27(5):2000-6. doi: 10.1021/la1042958. Epub 2011 Jan 7. Langmuir. 2011. PMID: 21214210

3

Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.

Cushen JD, Otsuka I, Bates CM, Halila S, Fort S, Rochas C, Easley JA, Rausch EL, Thio A, Borsali R, Willson CG, Ellison CJ. Cushen JD, et al. Among authors: ellison cj. ACS Nano. 2012 Apr 24;6(4):3424-33. doi: 10.1021/nn300459r. Epub 2012 Apr 12. ACS Nano. 2012. PMID: 22456229

4

Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains.

Bates CM, Seshimo T, Maher MJ, Durand WJ, Cushen JD, Dean LM, Blachut G, Ellison CJ, Willson CG. Bates CM, et al. Among authors: ellison cj. Science. 2012 Nov 9;338(6108):775-9. doi: 10.1126/science.1226046. Science. 2012. PMID: 23139327

5

Consequences of surface neutralization in diblock copolymer thin films.

Kim S, Bates CM, Thio A, Cushen JD, Ellison CJ, Willson CG, Bates FS. Kim S, et al. Among authors: ellison cj. ACS Nano. 2013 Nov 26;7(11):9905-19. doi: 10.1021/nn403616r. Epub 2013 Oct 21. ACS Nano. 2013. PMID: 24131385

6

Highly stretchable thermoset fibers and nonwovens using thiol-ene photopolymerization.

Shanmuganathan K, Elliot SM, Lane AP, Ellison CJ. Shanmuganathan K, et al. Among authors: ellison cj. ACS Appl Mater Interfaces. 2014 Aug 27;6(16):14259-65. doi: 10.1021/am503563q. Epub 2014 Aug 13. ACS Appl Mater Interfaces. 2014. PMID: 25075754

7

Precision Marangoni-driven patterning.

Arshad TA, Kim CB, Prisco NA, Katzenstein JM, Janes DW, Bonnecaze RT, Ellison CJ. Arshad TA, et al. Among authors: ellison cj. Soft Matter. 2014 Oct 28;10(40):8043-50. doi: 10.1039/c4sm01284d. Soft Matter. 2014. PMID: 25160514

8

Directed self-assembly of silicon-containing block copolymer thin films.

Maher MJ, Rettner CT, Bates CM, Blachut G, Carlson MC, Durand WJ, Ellison CJ, Sanders DP, Cheng JY, Willson CG. Maher MJ, et al. Among authors: ellison cj. ACS Appl Mater Interfaces. 2015 Feb 11;7(5):3323-8. doi: 10.1021/am508197k. Epub 2015 Jan 30. ACS Appl Mater Interfaces. 2015. PMID: 25594107

9

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST.

Cushen J, Wan L, Blachut G, Maher MJ, Albrecht TR, Ellison CJ, Willson CG, Ruiz R. Cushen J, et al. Among authors: ellison cj. ACS Appl Mater Interfaces. 2015 Jun 24;7(24):13476-83. doi: 10.1021/acsami.5b02481. Epub 2015 Jun 10. ACS Appl Mater Interfaces. 2015. PMID: 26004013

10

Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes.

Pandav G, Durand WJ, Ellison CJ, Willson CG, Ganesan V. Pandav G, et al. Among authors: ellison cj. Soft Matter. 2015 Dec 21;11(47):9107-14. doi: 10.1039/c5sm01951f. Soft Matter. 2015. PMID: 26411259

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