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Page 1
Photopatternable Interfaces for Block Copolymer Lithography.
Maher MJ, Bates CM, Blachut G, Carlson MC, Self JL, Janes DW, Durand WJ, Lane AP, Ellison CJ, Willson CG. Maher MJ, et al. Among authors: durand wj. ACS Macro Lett. 2014 Aug 19;3(8):824-828. doi: 10.1021/mz500370r. Epub 2014 Aug 7. ACS Macro Lett. 2014. PMID: 35590708
Directed self-assembly of silicon-containing block copolymer thin films.
Maher MJ, Rettner CT, Bates CM, Blachut G, Carlson MC, Durand WJ, Ellison CJ, Sanders DP, Cheng JY, Willson CG. Maher MJ, et al. Among authors: durand wj. ACS Appl Mater Interfaces. 2015 Feb 11;7(5):3323-8. doi: 10.1021/am508197k. Epub 2015 Jan 30. ACS Appl Mater Interfaces. 2015. PMID: 25594107
Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers.
Maher MJ, Mori K, Sirard SM, Dinhobl AM, Bates CM, Gurer E, Blachut G, Lane AP, Durand WJ, Carlson MC, Strahan JR, Ellison CJ, Willson CG. Maher MJ, et al. Among authors: durand wj. ACS Macro Lett. 2016 Mar 15;5(3):391-395. doi: 10.1021/acsmacrolett.6b00005. Epub 2016 Mar 1. ACS Macro Lett. 2016. PMID: 35614710