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PO x /Al2O3 Stacks for c-Si Surface Passivation: Material and Interface Properties.
Theeuwes RJ, Melskens J, Black LE, Beyer W, Koushik D, Berghuis WJH, Macco B, Kessels WMM. Theeuwes RJ, et al. Among authors: melskens j. ACS Appl Electron Mater. 2021 Oct 26;3(10):4337-4347. doi: 10.1021/acsaelm.1c00516. Epub 2021 Oct 12. ACS Appl Electron Mater. 2021. PMID: 34723186 Free PMC article.