SiGe epitaxy on a 300 mm batch furnace.
Naumann A, Sundqvist J, Ogiewa M, Boitier L, Czernohorsky M, Sienz S, Probst G, Jongbloed B, Beulens S, Maes JW, Thomas S.
Naumann A, et al. Among authors: jongbloed b.
J Nanosci Nanotechnol. 2011 Sep;11(9):8040-3. doi: 10.1166/jnn.2011.5093.
J Nanosci Nanotechnol. 2011.
PMID: 22097526