High-reflection Mo/Be/Si multilayers for EUV lithography.
Chkhalo NI, Gusev SA, Nechay AN, Pariev DE, Polkovnikov VN, Salashchenko NN, Schäfers F, Sertsu MG, Sokolov A, Svechnikov MV, Tatarsky DA.
Chkhalo NI, et al. Among authors: nechay an.
Opt Lett. 2017 Dec 15;42(24):5070-5073. doi: 10.1364/OL.42.005070.
Opt Lett. 2017.
PMID: 29240139