Ritala M - Search Results

1

Silicon oxide-niobium oxide mixture films and nanolaminates grown by atomic layer deposition from niobium pentaethoxide and hexakis(ethylamino) disilane.

Kukli K, Kemell M, Heikkilä MJ, Castán H, Dueñas S, Mizohata K, Ritala M, Leskelä M. Kukli K, et al. Among authors: ritala m. Nanotechnology. 2020 May 8;31(19):195713. doi: 10.1088/1361-6528/ab6fd6. Epub 2020 Jan 24. Nanotechnology. 2020. PMID: 31978899

2

Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources.

Ritala M, Kukli K, Rahtu A, Raisanen PI, Leskela M, Sajavaara T, Keinonen J. Ritala M, et al. Science. 2000 Apr 14;288(5464):319-21. doi: 10.1126/science.288.5464.319. Science. 2000. PMID: 10764641

3

Atomic layer deposition chemistry: recent developments and future challenges.

Leskelä M, Ritala M. Leskelä M, et al. Among authors: ritala m. Angew Chem Int Ed Engl. 2003 Nov 24;42(45):5548-54. doi: 10.1002/anie.200301652. Angew Chem Int Ed Engl. 2003. PMID: 14639717

4

Synthesis and characterisation of cyclopentadienyl complexes of barium: precursors for atomic layer deposition of BaTiO3.

Hatanpää T, Vehkamäki M, Mutikainen I, Kansikas J, Ritala M, Leskelä M. Hatanpää T, et al. Among authors: ritala m. Dalton Trans. 2004 Apr 21;(8):1181-8. doi: 10.1039/b400235k. Epub 2004 Mar 22. Dalton Trans. 2004. PMID: 15252658

5

In situ quadrupole mass spectrometry study of atomic-layer deposition of ZrO2 using Cp2Zr(CH3)2 and water.

Niinistö J, Rahtu A, Putkonen M, Ritala M, Leskelä M, Niinistö L. Niinistö J, et al. Among authors: ritala m. Langmuir. 2005 Aug 2;21(16):7321-5. doi: 10.1021/la0500732. Langmuir. 2005. PMID: 16042461

6

Atomic layer deposition in nanometer-level replication of cellulosic substances and preparation of photocatalytic TiO2/cellulose composites.

Kemell M, Pore V, Ritala M, Leskelä M, Lindén M. Kemell M, et al. Among authors: ritala m. J Am Chem Soc. 2005 Oct 19;127(41):14178-9. doi: 10.1021/ja0532887. J Am Chem Soc. 2005. PMID: 16218600

7

Destruction of Deinococcus geothermalis biofilm by photocatalytic ALD and sol-gel TiO2 surfaces.

Raulio M, Pore V, Areva S, Ritala M, Leskelä M, Lindén M, Rosenholm JB, Lounatmaa K, Salkinoja-Salonen M. Raulio M, et al. Among authors: ritala m. J Ind Microbiol Biotechnol. 2006 Apr;33(4):261-8. doi: 10.1007/s10295-005-0063-2. Epub 2005 Dec 14. J Ind Microbiol Biotechnol. 2006. PMID: 16362272

8

Atomic layer deposition process with TiF4 as a precursor for depositing metal fluoride thin films.

Pilvi T, Ritala M, Leskelä M, Bischoff M, Kaiser U, Kaiser N. Pilvi T, et al. Among authors: ritala m. Appl Opt. 2008 May 1;47(13):C271-4. doi: 10.1364/ao.47.00c271. Appl Opt. 2008. PMID: 18449257

9

Atomic layer deposition of photocatalytic TiO2 thin films from TiF4 and H2O.

Pore V, Kivelä T, Ritala M, Leskelä M. Pore V, et al. Among authors: ritala m. Dalton Trans. 2008 Dec 7;(45):6467-74. doi: 10.1039/b809953g. Epub 2008 Oct 9. Dalton Trans. 2008. PMID: 19002335

10

Atomic layer deposition of metal tellurides and selenides using alkylsilyl compounds of tellurium and selenium.

Pore V, Hatanpää T, Ritala M, Leskelä M. Pore V, et al. Among authors: ritala m. J Am Chem Soc. 2009 Mar 18;131(10):3478-80. doi: 10.1021/ja8090388. J Am Chem Soc. 2009. PMID: 19123860

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