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Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-χ Block Copolymers.
ACS Appl Mater Interfaces. 2019 Dec 26;11(51):48419-48427. doi: 10.1021/acsami.9b17858. Epub 2019 Dec 10.
ACS Appl Mater Interfaces. 2019.
PMID: 31752485
The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography.
Sunday DF, Chen X, Albrecht TR, Nowak D, Delgadillo PR, Dazai T, Miyagi K, Maehashi T, Yamazaki A, Nealey PF, Kline RJ.
Sunday DF, et al. Among authors: delgadillo pr.
Chem Mater. 2020;32(6):https://doi.org/10.1021/acs.chemmater.9b04833.
Chem Mater. 2020.
PMID: 33100517
Free PMC article.
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