Voelkel R - Search Results

1

Improvements on the uniformity of large-area microlens arrays in Fused Silica.

Kirner R, Béguelin J, Eisner M, Noell W, Scharf T, Voelkel R. Kirner R, et al. Among authors: voelkel r. Opt Express. 2019 Mar 4;27(5):6249-6258. doi: 10.1364/OE.27.006249. Opt Express. 2019. PMID: 30876213 Free article.

2

Two step process for the fabrication of diffraction limited concave microlens arrays.

Ruffieux P, Scharf T, Philipoussis I, Herzig HP, Voelkel R, Weible KJ. Ruffieux P, et al. Among authors: voelkel r. Opt Express. 2008 Nov 24;16(24):19541-9. doi: 10.1364/oe.16.019541. Opt Express. 2008. PMID: 19030040 Free article.

3

Fabrication and characterization of linear diffusers based on concave micro lens arrays.

Bitterli R, Scharf T, Herzig HP, Noell W, de Rooij N, Bich A, Roth S, Weible KJ, Voelkel R, Zimmermann M, Schmidt M. Bitterli R, et al. Among authors: voelkel r. Opt Express. 2010 Jun 21;18(13):14251-61. doi: 10.1364/OE.18.014251. Opt Express. 2010. PMID: 20588560 Free article.

4

Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm.

Kirner R, Vetter A, Opalevs D, Gilfert C, Scholz M, Leisching P, Scharf T, Noell W, Rockstuhl C, Voelkel R. Kirner R, et al. Among authors: voelkel r. Opt Express. 2018 Jan 22;26(2):730-743. doi: 10.1364/OE.26.000730. Opt Express. 2018. PMID: 29401954 Free article.

5

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source.

Vetter A, Kirner R, Opalevs D, Scholz M, Leisching P, Scharf T, Noell W, Rockstuhl C, Voelkel R. Vetter A, et al. Among authors: voelkel r. Opt Express. 2018 Aug 20;26(17):22218-22233. doi: 10.1364/OE.26.022218. Opt Express. 2018. PMID: 30130918 Free article.

6

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography.

Vetter A, Yan C, Kirner R, Scharf T, Noell W, Voelkel R, Rockstuhl C. Vetter A, et al. Among authors: voelkel r. Opt Express. 2019 Oct 28;27(22):32523-32535. doi: 10.1364/OE.27.032523. Opt Express. 2019. PMID: 31684463 Free article.

7

Optical characterization of high numerical aperture microlenses for quality assessment and fabrication process optimization.

Béguelin J, Symeonidis M, Noell W, Voelkel R, Scharf T. Béguelin J, et al. Among authors: voelkel r. Appl Opt. 2020 Apr 20;59(12):3601-3607. doi: 10.1364/AO.387346. Appl Opt. 2020. PMID: 32400494

8

Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniques.

Béguelin J, Noell W, Scharf T, Voelkel R. Béguelin J, et al. Among authors: voelkel r. Appl Opt. 2020 May 1;59(13):3910-3919. doi: 10.1364/AO.388453. Appl Opt. 2020. PMID: 32400660

9

Refraction limit of miniaturized optical systems: a ball-lens example.

Kim MS, Scharf T, Mühlig S, Fruhnert M, Rockstuhl C, Bitterli R, Noell W, Voelkel R, Herzig HP. Kim MS, et al. Among authors: voelkel r. Opt Express. 2016 Apr 4;24(7):6996-7005. doi: 10.1364/OE.24.006996. Opt Express. 2016. PMID: 27136993 Free article.

10

Flexible beam shaping system using fly's eye condenser.

Lindlein N, Bich A, Eisner M, Harder I, Lano M, Voelkel R, Weible K, Zimmermann M. Lindlein N, et al. Among authors: voelkel r. Appl Opt. 2010 Apr 20;49(12):2382-90. doi: 10.1364/AO.49.002382. Appl Opt. 2010. PMID: 20411020

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