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Ionic Liquids as Additives to Polystyrene- Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features.
Chen X, Zhou C, Chen SJ, Craig GSW, Rincon-Delgadillo P, Dazai T, Miyagi K, Maehashi T, Yamazaki A, Gronheid R, Stoykovich MP, Nealey PF. Chen X, et al. Among authors: gronheid r. ACS Appl Mater Interfaces. 2018 May 16;10(19):16747-16759. doi: 10.1021/acsami.8b02990. Epub 2018 May 3. ACS Appl Mater Interfaces. 2018. PMID: 29667409
Three-Tone Chemical Patterns for Block Copolymer Directed Self-Assembly.
Williamson LD, Seidel RN, Chen X, Suh HS, Rincon Delgadillo P, Gronheid R, Nealey PF. Williamson LD, et al. Among authors: gronheid r. ACS Appl Mater Interfaces. 2016 Feb 3;8(4):2704-12. doi: 10.1021/acsami.5b10562. Epub 2016 Jan 20. ACS Appl Mater Interfaces. 2016. PMID: 26742859
Characterizing Patterned Block Copolymer Thin Films with Soft X-rays.
Sunday DF, Ren J, Liman CD, Williamson LD, Gronheid R, Nealey PF, Kline RJ. Sunday DF, et al. Among authors: gronheid r. ACS Appl Mater Interfaces. 2017 Sep 20;9(37):31325-31334. doi: 10.1021/acsami.7b02791. Epub 2017 Jun 6. ACS Appl Mater Interfaces. 2017. PMID: 28541658
Evidence of speckle in extreme-UV lithography.
Pret AV, Gronheid R, Engelen J, Yan PY, Leeson MJ, Younkin TR. Pret AV, et al. Among authors: gronheid r. Opt Express. 2012 Nov 5;20(23):25970-8. doi: 10.1364/OE.20.025970. Opt Express. 2012. PMID: 23187412 Free article.
18 results