Nealey PF - Search Results

1

Directed Self-Assembly of Polystyrene-b-poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography.

Yang GW, Wu GP, Chen X, Xiong S, Arges CG, Ji S, Nealey PF, Lu XB, Darensbourg DJ, Xu ZK. Yang GW, et al. Among authors: nealey pf. Nano Lett. 2017 Feb 8;17(2):1233-1239. doi: 10.1021/acs.nanolett.6b05059. Epub 2017 Jan 27. Nano Lett. 2017. PMID: 28068100

2

Metal nanodot memory by self-assembled block copolymer lift-off.

Hong AJ, Liu CC, Wang Y, Kim J, Xiu F, Ji S, Zou J, Nealey PF, Wang KL. Hong AJ, et al. Among authors: nealey pf. Nano Lett. 2010 Jan;10(1):224-9. doi: 10.1021/nl903340a. Nano Lett. 2010. PMID: 19957954

3

Molecular transfer printing using block copolymers.

Ji S, Liu CC, Liu G, Nealey PF. Ji S, et al. Among authors: nealey pf. ACS Nano. 2010 Feb 23;4(2):599-609. doi: 10.1021/nn901342j. ACS Nano. 2010. PMID: 20041629

4

Three-dimensional directed assembly of block copolymers together with two-dimensional square and rectangular nanolithography.

Ji S, Nagpal U, Liao W, Liu CC, de Pablo JJ, Nealey PF. Ji S, et al. Among authors: nealey pf. Adv Mater. 2011 Aug 23;23(32):3692-7. doi: 10.1002/adma.201101813. Epub 2011 Jul 7. Adv Mater. 2011. PMID: 21735489 No abstract available.

5

Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates.

Ji S, Nagpal U, Liu G, Delcambre SP, Müller M, de Pablo JJ, Nealey PF. Ji S, et al. Among authors: nealey pf. ACS Nano. 2012 Jun 26;6(6):5440-8. doi: 10.1021/nn301306v. Epub 2012 May 10. ACS Nano. 2012. PMID: 22559146

6

In situ metallization of patterned polymer brushes created by molecular transfer print and fill.

Thode CJ, Cook PL, Jiang Y, Serdar Onses M, Ji S, Himpsel FJ, Nealey PF. Thode CJ, et al. Among authors: nealey pf. Nanotechnology. 2013 Apr 19;24(15):155602. doi: 10.1088/0957-4484/24/15/155602. Epub 2013 Mar 22. Nanotechnology. 2013. PMID: 23518622

7

InAs nanowires grown by metal-organic vapor-phase epitaxy (MOVPE) employing PS/PMMA diblock copolymer nanopatterning.

Huang Y, Kim TW, Xiong S, Mawst LJ, Kuech TF, Nealey PF, Dai Y, Wang Z, Guo W, Forbes D, Hubbard SM, Nesnidal M. Huang Y, et al. Among authors: nealey pf. Nano Lett. 2013;13(12):5979-84. doi: 10.1021/nl403163x. Epub 2013 Dec 2. Nano Lett. 2013. PMID: 24274630

8

Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition.

Kim S, Nealey PF, Bates FS. Kim S, et al. Among authors: nealey pf. Nano Lett. 2014 Jan 8;14(1):148-52. doi: 10.1021/nl403628d. Epub 2013 Dec 16. Nano Lett. 2014. PMID: 24328810

9

Defect removal in the course of directed self-assembly is facilitated in the vicinity of the order-disorder transition.

Li W, Nealey PF, de Pablo JJ, Müller M. Li W, et al. Among authors: nealey pf. Phys Rev Lett. 2014 Oct 17;113(16):168301. doi: 10.1103/PhysRevLett.113.168301. Epub 2014 Oct 15. Phys Rev Lett. 2014. PMID: 25361283

10

Three-Tone Chemical Patterns for Block Copolymer Directed Self-Assembly.

Williamson LD, Seidel RN, Chen X, Suh HS, Rincon Delgadillo P, Gronheid R, Nealey PF. Williamson LD, et al. Among authors: nealey pf. ACS Appl Mater Interfaces. 2016 Feb 3;8(4):2704-12. doi: 10.1021/acsami.5b10562. Epub 2016 Jan 20. ACS Appl Mater Interfaces. 2016. PMID: 26742859

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