Svechnikov MV - Search Results

1

Sub-micrometer resolution proximity X-ray microscope with digital image registration.

Chkhalo NI, Pestov AE, Salashchenko NN, Sherbakov AV, Skorokhodov EV, Svechnikov MV. Chkhalo NI, et al. Among authors: svechnikov mv. Rev Sci Instrum. 2015 Jun;86(6):063701. doi: 10.1063/1.4921849. Rev Sci Instrum. 2015. PMID: 26133838

2

High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength ranges.

Garakhin SA, Chkhalo NI, Kas'kov IA, Lopatin AY, Malyshev IV, Nechay AN, Pestov AE, Polkovnikov VN, Salashchenko NN, Svechnikov MV, Tsybin NN, Zabrodin IG, Zuev SY. Garakhin SA, et al. Among authors: svechnikov mv. Rev Sci Instrum. 2020 Jun 1;91(6):063103. doi: 10.1063/1.5144489. Rev Sci Instrum. 2020. PMID: 32611061

3

Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4-250 eV.

Svechnikov M, Chkhalo N, Lopatin A, Pleshkov R, Polkovnikov V, Salashchenko N, Schäfers F, Sertsu MG, Sokolov A, Tsybin N. Svechnikov M, et al. J Synchrotron Radiat. 2020 Jan 1;27(Pt 1):75-82. doi: 10.1107/S1600577519014188. Epub 2020 Jan 1. J Synchrotron Radiat. 2020. PMID: 31868739

4

Application of point diffraction interferometry for middle spatial frequency roughness detection.

Svechnikov MV, Chkhalo NI, Toropov MN, Salashchenko NN, Zorina MV. Svechnikov MV, et al. Opt Lett. 2015 Jan 15;40(2):159-62. doi: 10.1364/OL.40.000159. Opt Lett. 2015. PMID: 25679833

5

Resolving capacity of the circular Zernike polynomials.

Svechnikov MV, Chkhalo NI, Toropov MN, Salashchenko NN. Svechnikov MV, et al. Opt Express. 2015 Jun 1;23(11):14677-94. doi: 10.1364/OE.23.014677. Opt Express. 2015. PMID: 26072827 Free article.

6

Application of point diffraction interferometry for measuring angular displacement to a sensitivity of 0.01 arcsec.

Gavrilin DA, Kuzin SV, Salashchenko NN, Svechnikov MV, Toropov MN, Chkhalo NI, Soloviev AA. Gavrilin DA, et al. Among authors: svechnikov mv. Appl Opt. 2015 Nov 1;54(31):9315-9. doi: 10.1364/AO.54.009315. Appl Opt. 2015. PMID: 26560587

7

Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.

Svechnikov MV, Chkhalo NI, Gusev SA, Nechay AN, Pariev DE, Pestov AE, Polkovnikov VN, Tatarskiy DA, Salashchenko NN, Schäfers F, Sertsu MG, Sokolov A, Vainer YA, Zorina MV. Svechnikov MV, et al. Opt Express. 2018 Dec 24;26(26):33718-33731. doi: 10.1364/OE.26.033718. Opt Express. 2018. PMID: 30650805 Free article.

8

High-reflection Mo/Be/Si multilayers for EUV lithography.

Chkhalo NI, Gusev SA, Nechay AN, Pariev DE, Polkovnikov VN, Salashchenko NN, Schäfers F, Sertsu MG, Sokolov A, Svechnikov MV, Tatarsky DA. Chkhalo NI, et al. Among authors: svechnikov mv. Opt Lett. 2017 Dec 15;42(24):5070-5073. doi: 10.1364/OL.42.005070. Opt Lett. 2017. PMID: 29240139

9

Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm.

Polkovnikov VN, Chkhalo NI, Pleshkov RS, Salashchenko NN, Schäfers F, Sertsu MG, Sokolov A, Svechnikov MV, Zuev SY. Polkovnikov VN, et al. Among authors: svechnikov mv. Opt Lett. 2019 Jan 15;44(2):263-266. doi: 10.1364/OL.44.000263. Opt Lett. 2019. PMID: 30644876

10

Reflecting properties of narrowband Si/Al/Sc multilayer mirrors at 58.4 nm.

Chkhalo N, Polkovnikov V, Salashchenko N, Svechnikov M, Tsybin N, Vainer Y, Zuev S. Chkhalo N, et al. Opt Lett. 2020 Sep 1;45(17):4666-4669. doi: 10.1364/OL.400526. Opt Lett. 2020. PMID: 32870826

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