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Optical and structural properties of LaF3 thin films.
Bischoff M, Gäbler D, Kaiser N, Chuvilin A, Kaiser U, Tünnermann A. Bischoff M, et al. Among authors: tunnermann a. Appl Opt. 2008 May 1;47(13):C157-61. doi: 10.1364/ao.47.00c157. Appl Opt. 2008. PMID: 18449239
Extreme-ultraviolet-induced oxidation of Mo/Si multilayers.
Benoit N, Schröder S, Yulin S, Feigl T, Duparré A, Kaiser N, Tünnermann A. Benoit N, et al. Among authors: tunnermann a. Appl Opt. 2008 Jul 1;47(19):3455-62. doi: 10.1364/ao.47.003455. Appl Opt. 2008. PMID: 18594592
Plasma-etched organic layers for antireflection purposes.
Schulz U, Präfke C, Gödeker C, Kaiser N, Tünnermann A. Schulz U, et al. Among authors: tunnermann a. Appl Opt. 2011 Mar 20;50(9):C31-5. doi: 10.1364/AO.50.000C31. Appl Opt. 2011. PMID: 21460957
Mixed oxide coatings for optics.
Stenzel O, Wilbrandt S, Schürmann M, Kaiser N, Ehlers H, Mende M, Ristau D, Bruns S, Vergöhl M, Stolze M, Held M, Niederwald H, Koch T, Riggers W, Burdack P, Mark G, Schäfer R, Mewes S, Bischoff M, Arntzen M, Eisenkrämer F, Lappschies M, Jakobs S, Koch S, Baumgarten B, Tünnermann A. Stenzel O, et al. Among authors: tunnermann a. Appl Opt. 2011 Mar 20;50(9):C69-74. doi: 10.1364/AO.50.000C69. Appl Opt. 2011. PMID: 21460985
472 results