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Page 1
Visualizing individual nitrogen dopants in monolayer graphene.
Zhao L, He R, Rim KT, Schiros T, Kim KS, Zhou H, Gutiérrez C, Chockalingam SP, Arguello CJ, Pálová L, Nordlund D, Hybertsen MS, Reichman DR, Heinz TF, Kim P, Pinczuk A, Flynn GW, Pasupathy AN. Zhao L, et al. Among authors: pasupathy an. Science. 2011 Aug 19;333(6045):999-1003. doi: 10.1126/science.1208759. Science. 2011. PMID: 21852495
Engineering the Structural and Electronic Phases of MoTe2 through W Substitution.
Rhodes D, Chenet DA, Janicek BE, Nyby C, Lin Y, Jin W, Edelberg D, Mannebach E, Finney N, Antony A, Schiros T, Klarr T, Mazzoni A, Chin M, Chiu YC, Zheng W, Zhang QR, Ernst F, Dadap JI, Tong X, Ma J, Lou R, Wang S, Qian T, Ding H, Osgood RM Jr, Paley DW, Lindenberg AM, Huang PY, Pasupathy AN, Dubey M, Hone J, Balicas L. Rhodes D, et al. Among authors: pasupathy an. Nano Lett. 2017 Mar 8;17(3):1616-1622. doi: 10.1021/acs.nanolett.6b04814. Epub 2017 Feb 6. Nano Lett. 2017. PMID: 28145719
Signatures of the topological s +- superconducting order parameter in the type-II Weyl semimetal T d-MoTe2.
Guguchia Z, von Rohr F, Shermadini Z, Lee AT, Banerjee S, Wieteska AR, Marianetti CA, Frandsen BA, Luetkens H, Gong Z, Cheung SC, Baines C, Shengelaya A, Taniashvili G, Pasupathy AN, Morenzoni E, Billinge SJL, Amato A, Cava RJ, Khasanov R, Uemura YJ. Guguchia Z, et al. Among authors: pasupathy an. Nat Commun. 2017 Oct 20;8(1):1082. doi: 10.1038/s41467-017-01066-6. Nat Commun. 2017. PMID: 29057874 Free PMC article.
Author Correction: Signatures of the topological s+- superconducting order parameter in the type-II Weyl semimetal T d -MoTe2.
Guguchia Z, von Rohr F, Shermadini Z, Lee AT, Banerjee S, Wieteska AR, Marianetti CA, Frandsen BA, Luetkens H, Gong Z, Cheung SC, Baines C, Shengelaya A, Taniashvili G, Pasupathy AN, Morenzoni E, Billinge SJL, Amato A, Cava RJ, Khasanov R, Uemura YJ. Guguchia Z, et al. Among authors: pasupathy an. Nat Commun. 2018 Jan 10;9(1):201. doi: 10.1038/s41467-017-02460-w. Nat Commun. 2018. PMID: 29321471 Free PMC article.
Via Method for Lithography Free Contact and Preservation of 2D Materials.
Telford EJ, Benyamini A, Rhodes D, Wang D, Jung Y, Zangiabadi A, Watanabe K, Taniguchi T, Jia S, Barmak K, Pasupathy AN, Dean CR, Hone J. Telford EJ, et al. Among authors: pasupathy an. Nano Lett. 2018 Feb 14;18(2):1416-1420. doi: 10.1021/acs.nanolett.7b05161. Epub 2018 Feb 5. Nano Lett. 2018. PMID: 29385346
90 results