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Page 1
Photopatterning of Block Copolymer Thin Films.
Lane AP, Maher MJ, Willson CG, Ellison CJ. Lane AP, et al. Among authors: willson cg. ACS Macro Lett. 2016 Apr 19;5(4):460-465. doi: 10.1021/acsmacrolett.6b00075. Epub 2016 Mar 21. ACS Macro Lett. 2016. PMID: 35607242
Directed self-assembly of silicon-containing block copolymer thin films.
Maher MJ, Rettner CT, Bates CM, Blachut G, Carlson MC, Durand WJ, Ellison CJ, Sanders DP, Cheng JY, Willson CG. Maher MJ, et al. Among authors: willson cg. ACS Appl Mater Interfaces. 2015 Feb 11;7(5):3323-8. doi: 10.1021/am508197k. Epub 2015 Jan 30. ACS Appl Mater Interfaces. 2015. PMID: 25594107
Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces.
Kim JY, Liu P, Maher MJ, Callan DH, Bates CM, Carlson MC, Asano Y, Blachut G, Rettner CT, Cheng JY, Sunday DF, Kline RJ, Sanders DP, Lynd NA, Ellison CJ, Willson CG, Baiz CR. Kim JY, et al. Among authors: willson cg. ACS Appl Mater Interfaces. 2020 May 20;12(20):23399-23409. doi: 10.1021/acsami.0c02997. Epub 2020 May 9. ACS Appl Mater Interfaces. 2020. PMID: 32345022
Photopatternable Interfaces for Block Copolymer Lithography.
Maher MJ, Bates CM, Blachut G, Carlson MC, Self JL, Janes DW, Durand WJ, Lane AP, Ellison CJ, Willson CG. Maher MJ, et al. Among authors: willson cg. ACS Macro Lett. 2014 Aug 19;3(8):824-828. doi: 10.1021/mz500370r. Epub 2014 Aug 7. ACS Macro Lett. 2014. PMID: 35590708
Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers.
Maher MJ, Mori K, Sirard SM, Dinhobl AM, Bates CM, Gurer E, Blachut G, Lane AP, Durand WJ, Carlson MC, Strahan JR, Ellison CJ, Willson CG. Maher MJ, et al. Among authors: willson cg. ACS Macro Lett. 2016 Mar 15;5(3):391-395. doi: 10.1021/acsmacrolett.6b00005. Epub 2016 Mar 1. ACS Macro Lett. 2016. PMID: 35614710
55 results