Optical properties and bandgap evolution of ALD HfSiOx films.
Yang W, Fronk M, Geng Y, Chen L, Sun QQ, Gordan OD, Zhou P, Zahn DR, Zhang DW.
Yang W, et al. Among authors: geng y.
Nanoscale Res Lett. 2015 Feb 5;10:32. doi: 10.1186/s11671-014-0724-z. eCollection 2015.
Nanoscale Res Lett. 2015.
PMID: 25852329
Free PMC article.