Ellison CJ - Search Results

1

Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains.

Bates CM, Seshimo T, Maher MJ, Durand WJ, Cushen JD, Dean LM, Blachut G, Ellison CJ, Willson CG. Bates CM, et al. Among authors: ellison cj. Science. 2012 Nov 9;338(6108):775-9. doi: 10.1126/science.1226046. Science. 2012. PMID: 23139327

2

Polymeric cross-linked surface treatments for controlling block copolymer orientation in thin films.

Bates CM, Strahan JR, Santos LJ, Mueller BK, Bamgbade BO, Lee JA, Katzenstein JM, Ellison CJ, Willson CG. Bates CM, et al. Among authors: ellison cj. Langmuir. 2011 Mar 1;27(5):2000-6. doi: 10.1021/la1042958. Epub 2011 Jan 7. Langmuir. 2011. PMID: 21214210

3

Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.

Cushen JD, Otsuka I, Bates CM, Halila S, Fort S, Rochas C, Easley JA, Rausch EL, Thio A, Borsali R, Willson CG, Ellison CJ. Cushen JD, et al. Among authors: ellison cj. ACS Nano. 2012 Apr 24;6(4):3424-33. doi: 10.1021/nn300459r. Epub 2012 Apr 12. ACS Nano. 2012. PMID: 22456229

4

Consequences of surface neutralization in diblock copolymer thin films.

Kim S, Bates CM, Thio A, Cushen JD, Ellison CJ, Willson CG, Bates FS. Kim S, et al. Among authors: ellison cj. ACS Nano. 2013 Nov 26;7(11):9905-19. doi: 10.1021/nn403616r. Epub 2013 Oct 21. ACS Nano. 2013. PMID: 24131385

5

Directed self-assembly of silicon-containing block copolymer thin films.

Maher MJ, Rettner CT, Bates CM, Blachut G, Carlson MC, Durand WJ, Ellison CJ, Sanders DP, Cheng JY, Willson CG. Maher MJ, et al. Among authors: ellison cj. ACS Appl Mater Interfaces. 2015 Feb 11;7(5):3323-8. doi: 10.1021/am508197k. Epub 2015 Jan 30. ACS Appl Mater Interfaces. 2015. PMID: 25594107

6

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST.

Cushen J, Wan L, Blachut G, Maher MJ, Albrecht TR, Ellison CJ, Willson CG, Ruiz R. Cushen J, et al. Among authors: ellison cj. ACS Appl Mater Interfaces. 2015 Jun 24;7(24):13476-83. doi: 10.1021/acsami.5b02481. Epub 2015 Jun 10. ACS Appl Mater Interfaces. 2015. PMID: 26004013

7

Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes.

Pandav G, Durand WJ, Ellison CJ, Willson CG, Ganesan V. Pandav G, et al. Among authors: ellison cj. Soft Matter. 2015 Dec 21;11(47):9107-14. doi: 10.1039/c5sm01951f. Soft Matter. 2015. PMID: 26411259

8

Orthogonally Spin-Coated Bilayer Films for Photochemical Immobilization and Patterning of Sub-10-Nanometer Polymer Monolayers.

Janes DW, Kim CB, Maher MJ, Ellison CJ. Janes DW, et al. Among authors: ellison cj. Langmuir. 2016 Jul 12;32(27):6940-7. doi: 10.1021/acs.langmuir.6b01560. Epub 2016 Jun 28. Langmuir. 2016. PMID: 27351974

9

Structure, Stability, and Reorganization of 0.5 L₀ Topography in Block Copolymer Thin Films.

Maher MJ, Self JL, Stasiak P, Blachut G, Ellison CJ, Matsen MW, Bates CM, Willson CG. Maher MJ, et al. Among authors: ellison cj. ACS Nano. 2016 Nov 22;10(11):10152-10160. doi: 10.1021/acsnano.6b05390. Epub 2016 Nov 1. ACS Nano. 2016. PMID: 27787994

10

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae.

Lane AP, Yang X, Maher MJ, Blachut G, Asano Y, Someya Y, Mallavarapu A, Sirard SM, Ellison CJ, Willson CG. Lane AP, et al. Among authors: ellison cj. ACS Nano. 2017 Aug 22;11(8):7656-7665. doi: 10.1021/acsnano.7b02698. Epub 2017 Jul 20. ACS Nano. 2017. PMID: 28700207

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