Advanced elastomers with outstanding strength, toughness, and reusability hold significant potential for diverse applications. Using photochemistry and mechanochemistry to develop such materials has become a very effective strategy. Here, we report that photoreversible coumarin-based mechanophores that can make force-/light-triggered cycloreversion are chemically incorporated into polyurethane elastomers to simultaneously enhance their strength and toughness. Coumarin dimer mechanophore cross-linkers are formed in the polyurethane elastomer after exposure to 365 nm irradiation, leading to networks with dramatically enhanced mechanical properties. The tensile strength of the HNA-PU2000 elastomer with coumarin dimer mechanophore cross-linkers could increase from 13.9 to 26.9 MPa, elongation at break from 726 to 1053%, and toughness from 25.6 to 119.7 MJ·m-3, in contrast to its counterpart HNA-PU2000 elastomer without coumarin dimer mechanophores. Additionally, the polyurethane elastomer exhibits a decent reusable capability via force-/light-triggered cycloreversion of coumarin dimer mechanophores under mechanical stress or 254 nm irradiation. This mechano-/photochemical strategy to improve strength, toughness, and reusable capability of elastomers provides a facile approach for the development of high-performance elastomer materials.
Keywords: coumarin dimer mechanophores; enhanced strength and toughness; photo/mechanical response; photoreversibility; polyurethane elastomer.