Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis

Axl Eriksson; Anurag Kawde; Lukas Hrachowina; Sarah R McKibbin; Qi Shi; Magnus T Borgström; Thomas Wågberg; Tönu Pullerits; Jens Uhlig

doi:10.1021/acsomega.4c03039

Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis

ACS Omega. 2024 Apr 25;9(18):20623-20628. doi: 10.1021/acsomega.4c03039. eCollection 2024 May 7.

Authors

Axl Eriksson^{1

2}, Anurag Kawde^{1

3

2}, Lukas Hrachowina^{2

4}, Sarah R McKibbin^{2

4}, Qi Shi^{1

2}, Magnus T Borgström^{2

4}, Thomas Wågberg^{5

6}, Tönu Pullerits^{1

2}, Jens Uhlig^{1

3

2}

Affiliations

¹ Chemical Physics, Department of Chemistry, Lund University, Kemicentrum Naturvetarevägen 16, Lund 223 62, Sweden.
² NanoLund, Department of Physics, Lund University, Professorsgatan 1, Lund 223 63, Sweden.
³ Lund Institute of Advanced Neutron and X-ray Science, Lund University, Scheelevägen 19, Lund 223 70, Sweden.
⁴ Solid State Physics, Department of Physics, Lund University, Professorsgatan 1, Lund 223 63, Sweden.
⁵ Department of Physics, Umeå University, Linnaeus väg 20, Umeå 907 36, Sweden.
⁶ Wallenberg Initiative Materials Science for Sustainability, Department of Physics, Umeå University, Umeå 901 87, Sweden.

Abstract

Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65% higher PEC performance and 2.3 mA/cm² higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.