Structure-Related Electronic and Magnetic Properties in Ultrathin Epitaxial NixFe3-xO4 Films on MgO(001)

Nanomaterials (Basel). 2024 Apr 17;14(8):694. doi: 10.3390/nano14080694.

Abstract

Off-stoichiometric NixFe3-xO4 ultrathin films (x < 2.1) with varying Ni content x and thickness 16 (±2) nm were grown on MgO(001) by reactive molecular beam epitaxy. Synchrotron-based high-resolution X-ray diffraction measurements reveal vertical compressive strain for all films, resulting from a lateral pseudomorphic adaption of the film to the substrate lattice without any strain relaxation. Complete crystallinity with smooth interfaces and surfaces is obtained independent of the Ni content x. For x < 1 an expected successive conversion from Fe3O4 to NiFe2O4 is observed, whereas local transformation into NiO structures is observed for films with Ni content x > 1. However, angle-resolved hard X-ray photoelectron spectroscopy measurements indicate homogeneous cationic distributions without strictly separated phases independent of the Ni content, while X-ray absorption spectroscopy shows that also for x > 1, not all Fe2+ cations are substituted by Ni2+ cations. The ferrimagnetic behavior, as observed by superconducting quantum interference device magnetometry, is characterized by decreasing saturation magnetization due to the formation of antiferromagnetic NiO parts.

Keywords: SQUID; X-ray absorption spectroscopy; X-ray circular dichroism; X-ray diffraction; disordererd phase; hard X-ray photoelectron spectroscopy; nickel ferrite; strain-property relation; synchrotron radiation; ultrathin films.

Grants and funding

This research was funded by Deutsche Forschungsgemeinschaft (DFG) grant Nos. KU2321/6-1 and WO533/20-1.