Kβ/Kα X-ray intensity ratio values of Cu and Ag in CuxAg1-x (x = 53.5, 67.6, 76.9, 85.4, 89.6) thin alloy films produced from two different sources by the physical vapour deposition method have been determined by the Energy Dispersive X-ray Fluorescence Spectroscopy (EDXRF) method. The changes in the crystal structures of CuxAg1-x thin alloy films caused by the changes in the Cu and Ag concentrations, which affect the valence electronic structure have been investigated by the X-ray Diffraction (XRD) techniques. The obtained values were compared with the theoretical and fitted values for pure Cu and Ag elements.
Keywords: (241)Am source; Cu–Ag thin alloy film; K X-ray intensity ratios; Valance electronic structure.
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