Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

Jenna Multia; Dmitry E Kravchenko; Víctor Rubio-Giménez; Anish Philip; Rob Ameloot; Maarit Karppinen

doi:10.1021/acsanm.2c04934

Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

ACS Appl Nano Mater. 2023 Jan 10;6(2):827-831. doi: 10.1021/acsanm.2c04934. eCollection 2023 Jan 27.

Authors

Jenna Multia¹, Dmitry E Kravchenko², Víctor Rubio-Giménez², Anish Philip¹, Rob Ameloot², Maarit Karppinen¹

Affiliations

¹ Department of Chemistry and Materials Science, Aalto University, Aalto FI-00076, Finland.
² Centre for Membrane Separations, Adsorption, Catalysis and Spectroscopy, Katholieke Universiteit Leuven, Leuven 3001, Belgium.

Abstract

Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.