Author Correction: Influence of plasma treatment on SiO
2
/Si and Si
3
N
4
/Si substrates for large-scale transfer of graphene
Sci Rep
.
2021 Aug 20;11(1):17222.
doi: 10.1038/s41598-021-96605-z.
Authors
R Lukose
1
,
M Lisker
2
3
,
F Akhtar
2
,
M Fraschke
2
,
T Grabolla
2
,
A Mai
2
3
,
M Lukosius
2
Affiliations
1
IHP- Leibniz Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236, Frankfurt (Oder), Germany. lukose@ihp-microelectronics.com.
2
IHP- Leibniz Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236, Frankfurt (Oder), Germany.
3
Technical University of Applied Science Wildau, Hochschulring 1, 15745, Wildau, Germany.
PMID:
34417531
PMCID:
PMC8379266
DOI:
10.1038/s41598-021-96605-z
No abstract available
Publication types
Published Erratum