Liquid-Phase Quasi-Epitaxial Growth of Highly Stable, Monolithic UiO-66-NH2 MOF thin Films on Solid Substrates

Tawheed Hashem; Elvia P Valadez Sánchez; Peter G Weidler; Hartmut Gliemann; Mohamed H Alkordi; Christof Wöll

doi:10.1002/open.202000085

Liquid-Phase Quasi-Epitaxial Growth of Highly Stable, Monolithic UiO-66-NH₂ MOF thin Films on Solid Substrates

ChemistryOpen. 2020 May 4;9(5):514. doi: 10.1002/open.202000085. eCollection 2020 May.

Authors

Tawheed Hashem¹, Elvia P Valadez Sánchez^{1

2}, Peter G Weidler¹, Hartmut Gliemann¹, Mohamed H Alkordi³, Christof Wöll¹

Affiliations

¹ Institute of Functional Interfaces (IFG) Karlsruhe Institute of Technology (KIT) Hermann-von-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen Germany.
² Institute for Micro Process Engineering (IMVT) Karlsruhe Institute of Technology (KIT) Hermann-von-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen Germany.
³ Center for Materials Science Zewail City of Science and Technology, October Gardens, 6th of October Giza 12578 Egypt.

Abstract

Invited for this month's cover is the group of Dr. Tawheed Hashem from the Karlsruhe Institute of Technology. The cover picture shows a successful synthesis of high quality, monolithic UiO-66-NH₂ MOF thin films on diverse solid substrates via a low-temperature liquid phase epitaxy method. The achievement of continuous MOF-coatings with low defect densities and pronounced stability against high temperatures and hot water was proven. The new type of coatings clearly outperforms other reported types of MOF thin films. Read the full text of their Communication at https://doi.org/10.1002/open.201900324.