Orthogonal photo-switching of supramolecular patterned surfaces

Dongsheng Wang; Frank Schellenberger; Jonathan T Pham; Hans-Jürgen Butt; Si Wu

doi:10.1039/C8CC00770E

Orthogonal photo-switching of supramolecular patterned surfaces

Chem Commun (Camb). 2018 Mar 29;54(27):3403-3406. doi: 10.1039/C8CC00770E.

Authors

Dongsheng Wang¹, Frank Schellenberger², Jonathan T Pham³, Hans-Jürgen Butt², Si Wu⁴

Affiliations

¹ School of Optoelectronic Science and Engineering of UESTC, University of Electronic Science and Technology of China, No. 4, Section 2, North Jianshe Road, 610054, Chengdu, China.
² Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz, Germany. wusi@mpip-mainz.mpg.de.
³ Department of Chemical and Materials Engineering, University of Kentucky, 177 F. Paul Anderson Tower, Lexington, KY 40506, USA.
⁴ Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz, Germany. wusi@mpip-mainz.mpg.de and CAS Key Laboratory of Soft Matter Chemistry, Key Laboratory of Optoelectronic Science and Technology, Innovation Centre of Chemistry for Energy Materials, Department of Polymer Science and Engineering, University of Science and Technology of China Hefei, 230026, China. siwu@ustc.edu.cn.

PMID: 29557451
DOI: 10.1039/C8CC00770E

Abstract

We used Azo/α-CD and ipAzo/γ-CD host-guest complexes to demonstrate that four independent stable states can be orthogonally photo-switched by UV (365 nm), blue (470 nm), green (530 nm) and red light (625 nm). A supramolecular patterned surface was fabricated and orthogonally photo-switched by light with different wavelengths.