Highly Flexible and Porous Nanoparticle-Loaded Films for Dye Removal by Graphene Oxide-Fungus Interaction

ACS Appl Mater Interfaces. 2016 Dec 21;8(50):34638-34647. doi: 10.1021/acsami.6b10920. Epub 2016 Dec 6.

Abstract

Highly flexible and porous films with the ability to load various nanoscale adsorbents are of particular importance in the purification field. Herein, we report the sustainable and large-scale fabrication of a porous and flexible hybrid film based on the graphene oxide/hyphae interaction at a relatively low temperature of 130 °C. Under identical conditions, such films cannot be constructed with solely graphene oxide or hyphae. Moreover, through the addition of nanoscale building blocks [e.g., nanoscale poly(m-phenylenediamine) (PmPD) adsorbents] in the interaction process, the nanoparticles can be in situ loaded into the film. According to FTIR and XPS analyses, the film formation mechanisms mainly involve redox and cross-linking reactions between graphene oxide and fungus hyphae. In a proof-of-concept study, a PmPD nanoparticle-loaded hybrid film was used as a superior key component to build a flow-through adsorption device that displayed a promising adsorption performance toward dye pollutants.

Keywords: adsorption; film; fungus; graphene oxide; nanoparticles.