Van der Waals Force Isolation of Monolayer MoS2

Alper Gurarslan; Shuping Jiao; Tai-De Li; Guoqing Li; Yiling Yu; Yang Gao; Elisa Riedo; Zhiping Xu; Linyou Cao

doi:10.1002/adma.201601581

Van der Waals Force Isolation of Monolayer MoS₂

Adv Mater. 2016 Dec;28(45):10055-10060. doi: 10.1002/adma.201601581. Epub 2016 Sep 30.

Authors

Alper Gurarslan^{1

2}, Shuping Jiao³, Tai-De Li^{4

5}, Guoqing Li^{1

2}, Yiling Yu⁶, Yang Gao^{4

5}, Elisa Riedo^{4

5

7

8}, Zhiping Xu³, Linyou Cao^{1

6}

Affiliations

¹ Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, 27695, USA.
² Department of Fiber and Polymer Science, North Carolina State University, Raleigh, NC, 27695, USA.
³ Department of Mechanical Engineering, Tsinghua University, Beijing, 100084, China.
⁴ CUNY-Advanced Science Research Center, New York, NY, 10031, USA.
⁵ School of Physics, Georgia Institue of Technology, Atlanta, GA, 30332, USA.
⁶ Department of Physics, North Carolina State University, Raleigh, NC, 27695, USA.
⁷ Department of Physics, CUNY-City College of New York, New York, NY, 10031, USA.
⁸ Phyics Program, CUNY-The Graduate Center, New York, NY, 10016, USA.

PMID: 27690280
DOI: 10.1002/adma.201601581

Abstract

Monolayer MoS₂ can effectively screen the vdW interaction of underlying substrates with external systems by >90% because of the substantial increase in the separation between the substrate and external systems due to the presence of the monolayer. This substantial screening of vdW interactions by MoS₂ monolayer is different from what reported at graphene.