Flexible control of block copolymer directed self-assembly using small, topographical templates: potential lithography solution for integrated circuit contact hole patterning

Adv Mater. 2012 Jun 19;24(23):3107-14, 3082. doi: 10.1002/adma.201200265. Epub 2012 May 2.

Authors

He Yi¹, Xin-Yu Bao, Jie Zhang, Christopher Bencher, Li-Wen Chang, Xiangyu Chen, Richard Tiberio, James Conway, Huixiong Dai, Yongmei Chen, Subhasish Mitra, H-S Philip Wong

Affiliation

¹ Department of Electrical Engineering, Stanford University, 420 Via Palou, Stanford, CA 94305, USA.

PMID: 22550028
DOI: 10.1002/adma.201200265

No abstract available

Publication types

Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

Methacrylates / chemistry
Nanostructures / chemistry
Polymers / chemistry*
Polystyrenes / chemistry
Semiconductors

Substances

Methacrylates
Polymers
Polystyrenes
polystyrene-block-poly(methyl methacrylate)