Fabrication of hierarchical structures by unconventional two-step imprinting

J Colloid Interface Sci. 2012 Feb 15;368(1):655-9. doi: 10.1016/j.jcis.2011.11.042. Epub 2011 Dec 8.

Abstract

We present a simple sequential imprinting lithography method to fabricate micro/nanoscale hierarchical structures. This method involves hot embossing and capillary force lithography with two stamps of different microscales, which avoids using nanoscale stamps. By varying the experimental conditions in the capillary force lithography process, the morphology of the resulting structures can be controlled. This method may provide a facile and low-cost route for fabricating large area patterns of hierarchical structures.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Lab-On-A-Chip Devices*
  • Microscopy, Atomic Force
  • Nanostructures / chemistry*
  • Nanotechnology*
  • Silicon Dioxide / chemistry*

Substances

  • Silicon Dioxide