Chloride-based CVD growth of silicon carbide for electronic applications
Chem Rev
.
2012 Apr 11;112(4):2434-53.
doi: 10.1021/cr200257z.
Epub 2011 Dec 2.
Authors
Henrik Pedersen
1
,
Stefano Leone
,
Olof Kordina
,
Anne Henry
,
Shin-ichi Nishizawa
,
Yaroslav Koshka
,
Erik Janzén
Affiliation
1
Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping, Sweden. henke@ifm.liu.se
PMID:
22136412
DOI:
10.1021/cr200257z
No abstract available