High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

Adv Mater. 2010 Nov 2;22(41):4605-11. doi: 10.1002/adma.201001199.

Authors

Neil F Baril¹, Banafsheh Keshavarzi, Justin R Sparks, Mahesh Krishnamurthi, Ivan Temnykh, Pier J A Sazio, Anna C Peacock, Ali Borhan, Venkatraman Gopalan, John V Badding

Affiliation

¹ Department of Chemistry, Department of Materials Science and Engineeering and Materials Research Institute, Pennsylvania State University, University Park, PA 16802, USA.

PMID: 20827671
DOI: 10.1002/adma.201001199

No abstract available

Publication types

Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

Microscopy, Polarization / methods*
Optical Fibers / classification*
Optical Fibers / economics
Optical Fibers / trends
Pressure
Silicon / chemistry*

Substances

Silicon