Single layers of silver (Ag) nanoparticles embedded in silica (SiO2) have been fabricated by ultra-low-energy ion implantation. The distance between the Ag particles and the free SiO2 surface is controlled with nanometer precision. Raman scattering and reflectivity measurements strongly correlate to transmission electron microscopy analyses, allowing the use of these non-invasive techniques to monitor structural and dynamical properties. These results open up new opportunities to manipulate electromagnetic near-field interactions on wafer-scale plasmonic devices.