Additive soft-lithographic patterning of submicrometer- and nanometer-scale large-area resists on electronic materials

Nano Lett. 2005 Dec;5(12):2533-7. doi: 10.1021/nl051894u.

Abstract

We describe a novel soft-lithographic technique possessing broad utility for the fabrication of large area, nanoscale ( approximately 100 nm) multilayer resist structures on electronic material substrates. This additive patterning method transfers ultrathin poly(dimethylsiloxane) (PDMS) decals to an underlying SiO(2)-capped organic planarazation layer. The PDMS patterns serve as a latent image through which high-quality multilayer resist structures can be developed using reactive ion-beam etching.

Publication types

  • Research Support, Non-U.S. Gov't
  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Crystallization / methods*
  • Dimethylpolysiloxanes / chemistry*
  • Electronics*
  • Membranes, Artificial
  • Miniaturization / methods
  • Nanostructures / chemistry*
  • Nanostructures / ultrastructure*
  • Nanotechnology / methods
  • Particle Size
  • Photography / methods*
  • Silicon Dioxide / chemistry*
  • Silicones / chemistry*
  • Surface Properties

Substances

  • Dimethylpolysiloxanes
  • Membranes, Artificial
  • Silicones
  • baysilon
  • Silicon Dioxide