XeF2 etching of Si(111): The geometric structure of the reaction layer
Phys Rev B Condens Matter
.
1993 Jun 15;47(23):15648-15659.
doi: 10.1103/physrevb.47.15648.
Authors
CW Lo
,
DK Shuh
,
V Chakarian V
,
TD Durbin
,
PR Varekamp
,
JA Yarmoff
PMID:
10005957
DOI:
10.1103/physrevb.47.15648
No abstract available