Surface electronic states and stability of the H-terminated Si(100) 1 x 1 surface produced by low-temperature H-plasma exposure
Phys Rev B Condens Matter
.
1992 Dec 15;46(23):15212-15217.
doi: 10.1103/physrevb.46.15212.
Authors
J Cho
,
RJ Nemanich
PMID:
10003637
DOI:
10.1103/physrevb.46.15212
No abstract available